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  • Surface Analysis
    • Recent Developments and New Resources
    • Reproducibility Challenges and Solutions I
    • Reproducibility Challenges and Solutions II
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  • Vacuum & Equipment Technology

Reproducibility Challenges and Solutions II

JVST A: Topical Collection Reproducibility Challenges and Solutions II, with a Focus on Surface and Interface Analysis

Paper Categories and Topics First Author DOI
     
Selecting an appropriate surface analysis method, optimizing GCIBs, and roles of AI and ML
Selecting the best surface analysis method for your materials/samples Kye J. Robinson 10.1116/6.0003576
Challenges in porosity characterization of thin films: Cross-evaluation of different techniques Mikhail R. Baklanov 10.1116/6.0002793
Materials characterization: Can artificial intelligence be used to address reproducibility challenges? Miu Lun Lau 10.1116/6.0002809
Application of machine learning to spectrum and image data Satoka Aoyagi 10.1116/6.0002858
Sputter rates, depth resolution, and ion yields: A practical guide to choosing the best GCIB N. Sano 10.1116/6.0002864
 
SIMS – Quantification, Data Analysis and Interpretation
Novel principal component analysis tool based on python for analysis of complex spectra of TOF-SIMS Yadong Zhou 10.1116/6.0003355
Best practices for performing quantitative TOF-SIMS analyses Alan M. Spool 10.1116/6.0003660
   
SIMS Applications – Batteries, Nanoparticles, and Semiconductors 
VAMAS TWA interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS Francesca Bennet 10.1116/6.0002814
ToF-SIMS in battery research: Advantages, limitations, and best practices Teo Lombardo 10.1116/6.0002850
OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution Yundong Zhou 10.1116/6.0003821
Scanning Probe – STM Tips and Nanoindentation
In situ plasmonic tip preparation and validation techniques for scanning tunneling microscopy Benjamen N. Taber 10.1116/6.0002807
Some considerations in nanoindentation measurement and analysis by atomic force microscopy Irit Rosenhek-Goldian 10.1116/6.0003136
UPS Work Function Determination and Immersion Ellipsometry of Ultrathin Films.
Immersion ellipsometry for uncorrelated determination of ultrathin film thickness and index of refraction Samira Jafari 10.1116/6.0003511
Work function measurement by ultraviolet photoelectron spectroscopy: A versailles interlaboratory study Jeong Won Kim 10.1116/6.0002852
XPS Data Analysis Quality and Reporting Issues
Insufficient reporting of XPS instrumental and peak fitting parameters (metadata) in the literature George H. Major 10.1116/6.0002714
Perspective on improving the quality of data analysis in the literature with a focus on XPS George H. Major 10.1116/6.0002437
XPS Extracting Information – Approaches to Data Collection, Analysis, and Peak Fitting
The case for denoising/smoothing X-ray photoelectron spectroscopy data by Fourier analysis Alvaro J. Lizarbe 10.1116/6.0004167
Guide to XPS data analysis: Applying appropriate constraints to synthetic peaks in XPS peak fitting George H. Major 10.1116/6.0001975
Double Lorentzian lineshape for asymmetric peaks in photoelectron spectroscopy Alberto Herrera-Gomez 10.1116/6.0002602
Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective Paul S. Bagus 10.1116/6.0003081
Angle resolved xps assessment of the structure and composition of nanofilm using the multilayer model Alberto Herrera-Gomez 10.1116/6.0002981
Practical guides for XPS: Use of argon ion beams for sputter depth profiling and cleaning Alexander G. Shard 10.1116/6.0003681
Practical guide on chemometrics/informatics in XPS. I. Introduction to methods useful for large or complex datasets Tahereh G. Avval 10.1116/6.0002082
Practical guide on chemometrics/informatics in XPS. II. Example applications of multiple methods to the degradation of cellulose and tartaric acid Tahereh G. Avval 10.1116/6.0001969
Practical guide to understanding goodness-of-fit metrics used in chemical state modeling of x-ray photoelectron spectroscopy data by synthetic line shapes using nylon as an example Neal Fairley 10.1116/6.0002196
More from XPS: Informative but underused approaches to XPS data collection & analysis Donald R. Baer 10.1116/6.0004543
XPS – HAXPES and NAP-XPS
Introduction to reproducible laboratory hard x-ray photoelectron spectroscopy Kateryna Artyushkova 10.1116/6.0003740
Current Trends in NAP-XPS. Degree of Reporting of Instrument Parameters Matthew R. Linford (Still in final review)
 
XPS Application to Specific Types of Materials and Systems – Catalysts, Oxides, Insulators, Iron and Steels, Actinides, Radiation Sensitive Materials
Examination of the use of XPS O 1s to characterize oxygen vacancies in catalytic materials and beyond Christopher D. Easton 10.1116/6.0004686
Assignment of atomic charges in metal oxides based on core-level XPS spectra: The case of Ti in SrTiO3(001) Scott A. Chambers 10.1116/6.0004210
Following the propagation of erroneous XPS peak fitting through the literature. A genealogical approach B. Maxwell Clark 10.1116/6.0004093
Reevaluation of XPS Pt 4f peak fitting: Ti 3s plasmon peak interference and Pt metallic peak asymmetry in Pt@TiO2 system Min-Ju Choi 10.1116/6.0003973
Interpretation of complex X-ray photoelectron peak shapes. I. Case study of Fe 2p3/2 spectra A. E. Hughes 10.1116/6.0003804
Interpretation of complex X-ray photoelectron peak shapes. II. Case study of Fe 2p3/2 fitting applied to austenitic stainless steels 316 and 304 A. E. Hughes 10.1116/6.0003842
Review of actinide core-level photoemission Alaina Thompson 10.1116/6.0003534
XPS guide for insulators: Electron flood gun operation and optimization, surface charging, controlled charging, differential charging, useful FWHMs, problems and solutions, and advice B. Vincent Crist 10.1116/6.0003439
Photoemission spectroscopy on photoresist materials: A protocol for analysis of radiation-sensitive materials Faegheh S. Sajjadian 10.1116/6.0002808
Mission & ActivitiesSurface AnalysisVacuum & Equipment Technology
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