AVS_large
rpc_logo
  • Mission & Activities
  • Surface Analysis
    • Recent Developments and New Resources
    • Reproducibility Challenges and Solutions I
    • Reproducibility Challenges and Solutions II
    • Standards
    • Notes and Insights
    • Instrument Parameter Reporting
  • Vacuum & Equipment Technology

Reproducibility Challenges and Solutions I

JVST A: Topical Collection Reproducibility Challenges and Solutions with a Focus on XPS

Paper Categories and Topics First Author DOI JVSTA Reference
       
Experimental Information and Planning    
First steps in planning, conducting, and reporting XPS measurements* Baer, Donald R 10.1116/6.0000873 39(2021)021601
Introduction to X-Ray Photoelectron Spectroscopy (XPS) Stevie, Frederick A. 10.1116/6.0000412 38(2020)063204
Sample Handling, Preparation and Mounting for XPS Stevie, Frederick A. 10.1116/6.0000421 38(2020)063202
Standards and metrology as tools to address reproducibility XPS Unger, Wolfgang E. S. 10.1116/1.5131074 38(2020)021201
Common errors in XPS analysis and reporting Major, George H. 10.1116/6.0000685 38(2020)061204
Instrument Set Up and Data Collection    
A rapid procedure check XPS instrument performance Wolstenholme, John 10.1116/6.0000224 38(2020)043206
Intensity calibration for XPS instruments using low-density polyethylene Reed, Benjaman 10.1116/6.0000577 38(2020)063208
Extension of Intensity calibration to multiple instrument geometries. Shard, Alexander G. 10.1116/6.0000578 38(2020)063209
Introduction to lateral resolution and analysis area measurements in XPS Unger, Wolfgang E. S. 10.1116/6.0000398 38(2020)053206
XPS Guide: Charge neutralization and binding energy referencing for insulating samples Baer, Donald R 10.1116/6.0000057 38(2020)031204
Peak Identification, Peak Fitting and Quantitative Analysis    
A Tutorial on Interpreting X-ray Photoelectron Spectroscopy (XPS) Survey Spectra* Shah, Dhruv 10.1116/1.5043297

36(2018)062902

(JVSTB )

Guides to Quantitative XPS Shard, Alexander G. 10.1116/1.5141395 38(2020)041201
Perspective on quantitation accuracy in XPS Brundle, Christopher R. 10.1116/1.5141897 38(2020)041001
Introductory guide to backgrounds in XPS spectra Engelhard, Mark H. 10.1116/6.0000359 38(2020)063203
Practical guide for curve fitting in X-ray photoelectron spectroscopy Major, George H. 10.1116/6.0000377 38(2020)061203
Uncertainties in photoemission peak fitting Herrera-Gomez, Alberto 10.1116/1.5143132 38(2020)033211
Interpreting the Carbon 1s Spectrum Gengenbach, Thomas R. 10.1116/6.0000682 39(2021)013204
Correcting Peak Overlaps in Quantitative Auger Electron Spectroscopy of Cr-Containing Oxides Burrell, Michael C 10.1116/1.5128901 38(2020)013201
Path Lengths and Depth Information      
A Practical Guide to Path Lengths in XPS Powell, Cedric J. 10.1116/1.5141079 38(2020)023209
Experimental determination of electron attenuation lengths Chambers, Scott A. 10.1116/6.0000291 38(2020)043409
Practical Guide to the Use of Backgrounds in Quantitative XPS Tougaard, Sven 10.1116/6.0000661 39(2021)011201
Data and Reporting  
Data curation, archiving and storage Suzuki, Mineharu 10.1116/1.5128408 38(2020)023204
Role of consistent terminology in XPS reproducibility Baer, Donald R 10.1116/6.0000016 38(2020)031203
Technological or Scientific Applications   38(2020)033206
Achieving reproducibility in semiconductor technology Conard, Thierry 10.1116/1.5140746 38(2020)020804
Consistency and Reproducibility in Atomic Layer Deposition Sønsteby, Henrik H 10.1116/1.5140603 38(2020)023207
Guides for XPS Analysis of Polymers Easton, Christopher D. 10.1116/1.5140587 38(2020)033204
Guides to XPS study of catalysts Davies, Philip R. 10.1116/1.5140747 38(2020)061201
Guide to XPS measurements of Epitaxial Films and Heterostructures Chambers, Scott A. 10.1116/6.0000465 38(2020)031201
Guide to XPS Measurements on Nanoparticles Baer, Donald R. 10.1116/1.5141419 38(2020)023209
* Paper published before the topical collection was initiated but incorporated into the collection
Mission & ActivitiesSurface AnalysisVacuum & Equipment Technology
© 2026 AVS. All Rights Reserved.